• High-Temperature Oven Chamber: HTK 1200N with a robust design for in-situ X-ray diffraction studies in different atmospheres up to 1200 °C
  • High-Temperature Oven Chamber: HTK 1200N
  • High-Temperature Oven Chamber: HTK 1200N for combined reflection and transmission XRD studies at high temperatures up to 1200 °C
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High-Temperature Oven Chamber:
HTK 1200N

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The HTK 1200N is an advanced high-temperature chamber with a robust design for in-situ X-ray diffraction studies in different atmospheres up to 1200 °C. Its environmental heater guarantees excellent uniformity of the sample temperature. Use the HTK 1200N for different types of in-situ X-ray investigations, including studies of phase transformations, structure determination, and studies of chemical reactions.

Key features

Precise temperature measurement and control

  • Highly reliable temperature measurement right at the sample
  • Excellent temperature uniformity in the sample
  • Almost no restrictions on sample thickness


Sample spinning is crucial

  • Sample spinning option for optimum data quality
  • Sample carriers of various chemically resistant materials available
  • Quick exchange of sample carriers for easy sample preparation


The ideal tool for a wide range of applications

  • Robust and compact design using high quality materials
  • Fits most available goniometers
  • Available with automated motorized z-aligment stage for temperature-dependent sample realignment



Technical specifications

Operating temperature25 °C to 1200 °C
Temperature measurementPt 10% RhPt thermocouple
AtmospheresVacuum (10-4 mbar), air, inert gases
Max. operating pressure1 bar above atmospheric pressure
Angle of incidence0 to 164° 2Θ
Sample holder materialAluminum oxide
Sample diametermax. 16 mm
Measurement geometryReflection + transmission

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