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  4. Engineering Performance at the Micron Level: Advanced Particle Size Analysis with DIF 100

Engineering Performance at the Micron Level: Advanced Particle Size Analysis with DIF 100

Precise particle size characterization is a critical control parameter in cement, ceramics, glass, and semiconductor applications. Variations in particle size distribution (PSD), fine fractions, or morphology can directly impact hydration kinetics, densification, melt homogeneity, slurry stability, strength, defects, polishing performance, and overall yield. Conventional sieve and low-resolution methods often miss sub-micron particles and agglomeration effects.

Join our advanced technical webinar to explore how the DIF 100 Laser Diffraction system from Anton Paar uses advanced light scattering principles and optimized dispersion to deliver high-resolution, statistically reliable particle characterization for R&D and plant-level quality control.

Discover how improved measurement accuracy can reduce variability, lower rejection rates, enhance process consistency, and drive measurable production efficiency.

 

Key Highlights

  • Role of particle size in material performance

  • Fundamentals of laser diffraction measurement

  • Comparison with conventional sizing techniques

  • Wet vs. dry dispersion strategies

  • Supporting quality control and process optimization

  • Live Q&A with Anton Paar technical expert


Mr Priyanshu Pratap Singh (語言: English)
Priyanshu Pratap Singh

Priyanshu Pratap Singh is an Application Specialist at Anton Paar India with over eight years of experience in heterogeneous catalysis, including high-pressure experimentation and DFT-based modeling. He has worked on national projects involving bio-aviation fuel and coal gasification. Priyanshu pursues a Ph.D. in Chemical Engineering from IIT (ISM) Dhanbad and is proficient with advanced analytical instruments and simulation tools. His expertise spans materials characterization, process scale-up, and analytical instrumentation for research and industrial applications.