Microwave-Assisted Large-Scale Synthesis of Photoresists

Copoly(2-oxazoline)s were synthesized from microwave-assisted cationic ring-opening copolymerizations in an ionic liquid in 250 g batch quantities. These copoly(2-oxazoline)s with dedicated functionalities can be applied as a crosslinkable photoresist with a resolution of 1 μm.

Photolithography is a standard routine for the production of 2.5-dimensional polymer structures.

In the case of negative photoresists the illuminated parts become insoluble and, hence, reproduce the pattern preset by an illumination mask in negative fashion.

Precedent studies have revealed that copoly(2-oxazoline)s with olefinic functionalities can be crosslinked upon the application of UV light by thiol-ene reaction with oligofunctional thiols.


Small-scale syntheses (10 mL) were performed in Monowave 400 employing glass vials G30 as well as G30 Wide Neck.

Large-scale syntheses (700 mL) were performed in Masterwave BTR equipped with an internal Pt100 temperature sensor.

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