X-Ray Reflectivity: A Powerful Tool for Thin Film Analysis

Modern powder X-ray diffractometers are often required to be multipurpose and capable of handling various applications. This is especially the case in research environments, where XRD instruments may be used by many different user groups with different samples and requirements. This results in the instruments being used for not only traditional powder XRD measurements, but also more advanced methods such as X-ray reflectivity (XRR), pair distribution function (PDF) analysis, small-angle X-ray scattering (SAXS) and non-ambient XRD.
This webinar will focus on XRR measurements. XRR is typically used to study thin films or coatings on a substrate with a film thickness ranging from a monolayer up to a few hundred nanometers. Fitting the XRR curve gives valuable information on the film and layer thickness, density and roughness. The major advantage of this method over others is that it can also be used to study and characterize buried layers and interfaces in a non-destructive manner.
During the webinar, we will introduce the XRR method and discover what sample information can be obtained from the data. We will also discuss the necessary hardware and how you can easily adapt your powder XRD instrument for these measurements to get optimal results.

Webinar content:

  • Introduction to X-ray reflectivity (XRR) measurements
  • Discussion on the information that can be obtained by fitting XRR data


Target group:

  • Anyone interested in the structural characterization of thin films and coatings
  • Anyone who would like to extend their XRD instrument to perform XRR measurements
  • Anyone working in research and development of thin films and coatings
Dr. Benedikt Schrode (English)
Dr. Benedikt Schrode (English)
Benedikt Schrode

Benedikt Schrode studied technical physics at Graz University of Technology. In his PhD, he focused on the preparation and characterization of epitaxially grown organic thin films by (grazing incidence) X-ray diffraction using lab instruments and synchrotron sources. In July 2020, he joined Anton Paar as an application specialist for X-ray diffraction.

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