Semiconductor metrology: How to determine, control, and improve various parameters during the wafer production process

Semiconductor metrology: How to determine, control, and improve various parameters during the wafer production process


In this webinar we will present a mix of different solutions to help you ensure and control the quality during almost every step in the whole wafer production process.

Find out more about the following techniques: 

  • Reproducible, quantitative, and rapid surface roughness and height measurements with high precision using AFM. This technology is known for its unprecedented precision and reproducibility, but has often been considered too time-consuming and thus not efficient enough. In this webinar, we focus on the new-generation usability and efficiency of Tosca AFM measurements and show the benefits for efficient, fast, and reliable AFM wafer analysis. 
  • Surface charge analysis used as a direct tool to monitor wafer cleaning effects. We discuss how knowledge of the zeta potential is used to tune wafer-particle interactions in the CMP process. 
  • Mechanical surface characterization of layers on wafers on the nanoscale with nanoindentation and nanoscratch measurements. These two techniques can be used to measure hardness, adhesion, or scratch resistance of thin films on wafers in microchip production or on protective layers on glass in display manufacturing. 
  • Accurate, fast, efficient, and safe concentration measurement of chemicals for semiconductor production. Learn how easy it is to use a digital density meter to determine the concentration of several acids and bases. High measurement performance is key for quality inspection during etching and cleaning steps in the semiconductor industry. 

Tarih: 2020-11-23, 09:00 - 09:45 (CET UTC+01:00)
Dil: English
Eğitmen: Dr. Dr. Jelena Fischer, Jiří Nohava, PhD., Dr. Thomas Luxbacher, Marcel Urban

Jelena Fischer studied Chemistry in Chicago, received her PhD from Graz University of Technology and has subsequently been a visiting scientist at the University of California at Davis. She has published scientific work in top-notch journals such as Science and is the co-inventor of two patented inventions. Her second PhD is in Engineering Management, which has been the major focus of her work over the past 15 years. She joined Anton Paar in 2012 and is the Product Manager for Tosca Series AFM.

Jiri Nohava is the Head of Product Competence & Lead Application Scientist of the Mechanical Surface Characterization unit at Anton Paar. He obtained his PhD in materials science at the Czech Technical University in Prague. He joined Anton Paar in 2007 and has become a specialist in instrumented indentation and tribology in various domains. His main task is development of new applications with Anton Paar instruments in scientific and industrial projects. He regularly publishes in peer-reviewed journals and participates in international conferences.

Thomas Luxbacher received his PhD degree in Technical Chemistry at Graz University of Technology and looks back at almost 20 years of experience as a product manager in different areas. He is currently the principal scientist for surface charge and zeta potential at Anton Paar GmbH.

Marcel Urban is the international product manager for density and concentration meters at the Anton Paar headquarters in Austria. His background is sensor technology with many years’ experience in different industries like industrial, medical and automotive. He graduated with a Master’s degree in Microelectronics at the Carinthian Tech Institute in Villach, Austria 2000. Marcel Urban joined Anton Paar in June 2019.

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